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Journal of Applied Physics

Volumn 106, Issue 5, 2009, Pages

Effects of SrRuO3 buffer layer thickness on multiferroic (Bi0.90La0.10) (Fe0.95Mn0.05) O 3 thin films

(2) Wu, Jiagang a Wang, John a

a NATIONAL UNIVERSITY OF SINGAPORE (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

BUFFER LAYER THICKNESS; CO-DOPING; FERROELECTRIC BEHAVIOR; FERROELECTRIC FATIGUE; LOW-LEAKAGE CURRENT; MAGNETIC BEHAVIOR; MULTIFERROICS; OFF-AXIS; ORIENTATION CHANGES; P-E HYSTERESIS LOOPS; RADIO FREQUENCY SPUTTERING; ROOM TEMPERATURE; SI (100) SUBSTRATE; SRO BUFFER; SWITCHING CYCLES; TIO;

BUFFER LAYERS; FERROELECTRICITY; HYSTERESIS; HYSTERESIS LOOPS; LEAKAGE CURRENTS; MAGNETIC MATERIALS; MANGANESE; MANGANESE COMPOUNDS; SILICON COMPOUNDS; THIN FILM DEVICES; THIN FILMS;

FERROELECTRIC FILMS;

EID: 70349330333 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3213335 Document Type: Article

Times cited : (64)

References (19)

1
- 0037436499
- 3 multiferroic thin film heterostructures
- DOI 10.1126/science.1080615
- J. Wang, J. B. Neaton, H. Zheng, V. Nagarajan, S. B. Ogale, B. Liu, D. Viehland, V. Vaithyanathan, D. G. Schlom, U. V. Waghmare, N. A. Spaldin, K. M. Rabe, M. Wuttig, and R. Ramesh, Science 0036-8075 299, 1719 (2003). 10.1126/science.1080615 (Pubitemid 36337195)
- (2003) Science , vol.299 , Issue.5613 , pp. 1719-1722
- Wang, J.¹ Neaton, J.B.² Zheng, H.³ Nagarajan, V.⁴ Ogale, S.B.⁵ Liu, B.⁶ Viehland, D.⁷ Vaithyanathan, V.⁸ Schlom, D.G.⁹ Waghmare, U.V.¹⁰ Spaldin, N.A.¹¹ Rabe, K.M.¹² Wuttig, M.¹³ Ramesh, R.¹⁴

2
- 64249168806
- T. Choi, S. Lee, Y. J. Choi, V. Kiryukhin, and S. W. Cheong, Science 324, 63 (2009).
- (2009) Science , vol.324 , pp. 63
- Choi, T.¹ Lee, S.² Choi, Y.J.³ Kiryukhin, V.⁴ Cheong, S.W.⁵

3
- 33748892269
- Ferroelectric thin films: Review of materials, properties, and applications
- DOI 10.1063/1.2336999
- N. Setter, D. Damjanovic, L. Eng, G. Fox, S. Gevorgian, S. Hong, A. Taganstev, D. V. Taylor, T. Yamada, and S. Streiffer, J. Appl. Phys. 0021-8979 100, 051606 (2006). 10.1063/1.2336999 (Pubitemid 44424530)
- (2006) Journal of Applied Physics , vol.100 , Issue.5 , pp. 051606
- Setter, N.¹ Damjanovic, D.² Eng, L.³ Fox, G.⁴ Gevorgian, S.⁵ Hong, S.⁶ Kingon, A.⁷ Kohlstedt, H.⁸ Park, N.Y.⁹ Stephenson, G.B.¹⁰ Stolitchnov, I.¹¹ Taganstev, A.K.¹² Taylor, D.V.¹³ Yamada, T.¹⁴ Streiffer, S.¹⁵

4
- 53349092141
- 0002-7820. 10.1111/j.1551-2916.2008.02536.x
- R. Y. Zheng, C. H. Sim, J. Wang, and S. Ramakrishna, J. Am. Ceram. Soc. 0002-7820 91, 3240 (2008). 10.1111/j.1551-2916.2008.02536.x
- (2008) J. Am. Ceram. Soc. , vol.91 , pp. 3240
- Zheng, R.Y.¹ Sim, C.H.² Wang, J.³ Ramakrishna, S.⁴

5
- 34548066514
- Temperature-dependent leakage mechanisms of PtBiFe O3 SrRu O3 thin film capacitors
- DOI 10.1063/1.2772666
- H. Yang, M. Jain, N. A. Suvorova, H. Zhou, H. M. Luo, D. M. Feldmann, P. C. Dowden, R. F. DePaula, S. R. Foltyn, and Q. X. Jia, Appl. Phys. Lett. 0003-6951 91, 072911 (2007). 10.1063/1.2772666 (Pubitemid 47287649)
- (2007) Applied Physics Letters , vol.91 , Issue.7 , pp. 072911
- Yang, H.¹ Jain, M.² Suvorova, N.A.³ Zhou, H.⁴ Luo, H.M.⁵ Feldmann, D.M.⁶ Dowden, P.C.⁷ Depaula, R.F.⁸ Foltyn, S.R.⁹ Jia, Q.X.¹⁰

6
- 65449163069
- 0003-6951. 10.1063/1.3127519
- J. G. Wu, G. Q. Kang, H. J. Liu, and J. Wang, Appl. Phys. Lett. 0003-6951 94, 172906 (2009). 10.1063/1.3127519
- (2009) Appl. Phys. Lett. , vol.94 , pp. 172906
- Wu, J.G.¹ Kang, G.Q.² Liu, H.J.³ Wang, J.⁴

7
- 67650245758
- 0021-8979. 10.1063/1.3153955
- J. G. Wu and J. Wang, J. Appl. Phys. 0021-8979 105, 124107 (2009). 10.1063/1.3153955
- (2009) J. Appl. Phys. , vol.105 , pp. 124107
- Wu, J.G.¹ Wang, J.²

8
- 31544473506
- 3 thin films
- DOI 10.1063/1.2167793, 042903
- Y. H. Lee, J. M. Wu, and C. H. Lai, Appl. Phys. Lett. 0003-6951 88, 042903 (2006). 10.1063/1.2167793 (Pubitemid 43164076)
- (2006) Applied Physics Letters , vol.88 , Issue.4 , pp. 1-3
- Lee, Y.-H.¹ Wu, J.-M.² Lai, C.-H.³

9
- 63049106713
- 0003-6951. 10.1063/1.3098408
- T. Kawae, Y. Terauchi, H. Tsuda, M. Kumeda, and A. Morimoto, Appl. Phys. Lett. 0003-6951 94, 112904 (2009). 10.1063/1.3098408
- (2009) Appl. Phys. Lett. , vol.94 , pp. 112904
- Kawae, T.¹ Terauchi, Y.² Tsuda, H.³ Kumeda, M.⁴ Morimoto, A.⁵

10
- 1842581494
- 0003-6951. 10.1063/1.1667612
- Y. P. Wang, L. Zhou, M. F. Zhang, X. Y. Chen, J. M. Liu, and Z. G. Liu, Appl. Phys. Lett. 0003-6951 84, 1731 (2004). 10.1063/1.1667612
- (2004) Appl. Phys. Lett. , vol.84 , pp. 1731
- Wang, Y.P.¹ Zhou, L.² Zhang, M.F.³ Chen, X.Y.⁴ Liu, J.M.⁵ Liu, Z.G.⁶

11
- 36248930886
- Microstructure and frequency dependent electrical properties of Mn-substituted BiFe O3 thin films
- DOI 10.1063/1.2812594
- S. K. Singh, H. Ishiwara, K. Sato, and K. Maruyama, J. Appl. Phys. 0021-8979 102, 094109 (2007). 10.1063/1.2812594 (Pubitemid 350129037)
- (2007) Journal of Applied Physics , vol.102 , Issue.9 , pp. 094109
- Singh, S.K.¹ Ishiwara, H.² Sato, K.³ Maruyama, K.⁴

12
- 18744378644
- 0003-6951. 10.1063/1.1862336
- X. D. Qi, J. Dho, R. Tomov, M. G. Blamire, and J. L. MacManus-Driscoll, Appl. Phys. Lett. 0003-6951 86, 062903 (2005). 10.1063/1.1862336
- (2005) Appl. Phys. Lett. , vol.86 , pp. 062903
- Qi, X.D.¹ Dho, J.² Tomov, R.³ Blamire, M.G.⁴ MacManus-Driscoll, J.L.⁵

13
- 28044456595
- 3 thin films fabricated by chemical solution deposition
- DOI 10.1143/JJAP.44.L561
- H. Uchida, R. Ueno, H. Nakaki, H. Funakubo, and S. Koda, Jpn. J. Appl. Phys., Part 2 0021-4922 44, L561 (2005). 10.1143/JJAP.44.L561 (Pubitemid 43078348)
- (2005) Japanese Journal of Applied Physics, Part 2: Letters , vol.44 , Issue.16-19
- Uchida, H.¹ Ueno, R.² Nakaki, H.³ Funakubo, H.⁴ Koda, S.⁵

14
- 3142655788
- 0003-6951. 10.1063/1.1764944
- J. F. Li, J. L. Wang, M. Wuttig, R. Ramesh, N. Wang, B. Ruette, A. P. Pyatakov, A. K. Zvezdin, and D. Viehland, Appl. Phys. Lett. 0003-6951 84, 5261 (2004). 10.1063/1.1764944
- (2004) Appl. Phys. Lett. , vol.84 , pp. 5261
- Li, J.F.¹ Wang, J.L.² Wuttig, M.³ Ramesh, R.⁴ Wang, N.⁵ Ruette, B.⁶ Pyatakov, A.P.⁷ Zvezdin, A.K.⁸ Viehland, D.⁹

15
- 0001473005
- 0003-6951. 10.1063/1.126786
- J. F. Scott and M. Dawber, Appl. Phys. Lett. 0003-6951 76, 3801 (2000). 10.1063/1.126786
- (2000) Appl. Phys. Lett. , vol.76 , pp. 3801
- Scott, J.F.¹ Dawber, M.²

16
- 33746095788
- Investigation on the origin of the magnetic moment of BiFeO3 thin films by advanced x-ray characterizations
- DOI 10.1103/PhysRevB.74.020101
- H. B́a, M. Bibes, S. Fusil, K. Bouzehouane, E. Jacquet, K. Rode, P. Bencok, and A. Barth́ĺmy, Phys. Rev. B 0163-1829 74, 020101 (R) (2006). 10.1103/PhysRevB.74.020101 (Pubitemid 44079232)
- (2006) Physical Review B - Condensed Matter and Materials Physics , vol.74 , Issue.2 , pp. 020101
- Bea, H.¹ Bibes, M.² Fusil, S.³ Bouzehouane, K.⁴ Jacquet, E.⁵ Rode, K.⁶ Bencok, P.⁷ Barthelemy, A.⁸

17
- 20844441189
- 3 magnetoferroelectric thin films
- DOI 10.1063/1.1941474, 222903
- D. Lee, M. G. Kim, S. Ryu, H. M. Jang, and S. G. Lee, Appl. Phys. Lett. 0003-6951 86, 222903 (2005). 10.1063/1.1941474 (Pubitemid 40861612)
- (2005) Applied Physics Letters , vol.86 , Issue.22 , pp. 1-3
- Lee, D.¹ Kim, M.G.² Ryu, S.³ Jang, H.M.⁴ Lee, S.G.⁵

18
- 18944368523
- 0036-8075. 10.1126/science.1105422
- W. Eerenstein, F. D. Morrison, J. Dho, M. G. Blamire, J. F. Scott, and N. D. Mathur, Science 0036-8075 307, 1203 (2005). 10.1126/science.1105422
- (2005) Science , vol.307 , pp. 1203
- Eerenstein, W.¹ Morrison, F.D.² Dho, J.³ Blamire, M.G.⁴ Scott, J.F.⁵ Mathur, N.D.⁶

19
- 33846875281
- 0.7 substrates
- DOI 10.1143/JJAP.45.L755
- K. Takahashi and M. Tonouchi, Jpn. J. Appl. Phys., Part 2 0021-4922 45, L755 (2006). 10.1143/JJAP.45.L755 (Pubitemid 47387201)
- (2006) Japanese Journal of Applied Physics, Part 2: Letters , vol.45 , Issue.29-32
- Takahashi, K.¹ Tonouchi, M.²

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