Decomposition kinetics in Ti1-xAlxN coatings as studied by in-situ X-ray diffraction during annealing

Surface and Coatings Technology

Volumn 206, Issue 7, 2011, Pages 1727-1734

  Wustefeld C ^a   Rafaja, D ^a   Dopita, M ^a   Motylenko, M ^a   Baehtz, C ^b   Michotte, C ^c   Kathrein, M ^d  

^a TU BERGAKADEMIE FREIBERG   (Germany)

^b INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

^c Ceratizit Luxembourg Sàrl ^*  (Luxembourg)

^d CERATIZIT AUSTRIA GMBH   (Austria)

Author keywords

Bias voltage; Cathodic arc evaporation; Microstructure; Thermal stability; Ti Al N; X ray diffraction

Indexed keywords

ALUMINIUM CONTENT; CATHODIC ARC; CATHODIC ARC EVAPORATION; DECOMPOSITION KINETICS; DEPOSITION PARAMETERS; GLANCING ANGLE X-RAY DIFFRACTIONS; HIGH TEMPERATURE; IN-SITU SYNCHROTRONS; IN-SITU X-RAY DIFFRACTION; LATTICE STRAIN; MICROSTRUCTURE EVOLUTIONS; TI-AL-N;

ANNEALING; BIAS VOLTAGE; COATINGS; MICROSTRUCTURE; SPINODAL DECOMPOSITION; THERMODYNAMIC STABILITY; X RAY DIFFRACTION;

ALUMINUM;

EID: 82755192910     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2011.09.041     Document Type: Article

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