Decomposition pathways in age hardening of Ti-Al-N films

Journal of Applied Physics

Volumn 110, Issue 2, 2011, Pages

  Rachbauer, R ^a   Massl, S ^a,b   Stergar, E ^a,c   Holec, D ^a   Kiener, D ^a,b   Keckes, J ^a,b   Patscheider, J ^d   Stiefel, M ^d   Leitner, H ^a   Mayrhofer, P H ^a  

^a UNIVERSITY OF LEOBEN   (Austria)

^b ERICH SCHMID INSTITUTE OF MATERIALS SCIENCE   (Austria)

^c University of California   (United States)

^d SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

A-THERMAL; AB INITIO CALCULATIONS; ALN; ANNEALING TIME; ATOM PROBE TOMOGRAPHY; ATOMIC SCALE; BINARY NITRIDES; CHEMICAL CHANGE; COLUMN BOUNDARIES; COMBINED EFFECT; COMPLEX NITRIDES; DECOMPOSITION KINETICS; DECOMPOSITION PATHWAY; EXPERIMENTAL OBSERVATION; MICRO-STRAIN; POST ANNEALING; STRAIN FORMATION; THERMODYNAMICALLY STABLE; TI-AL-N; WORK LOADS; WURTZITES;

ALUMINUM; CALCULATIONS; HIGH RESOLUTION ELECTRON MICROSCOPY; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; NANOINDENTATION; PROTECTIVE COATINGS; SPINODAL DECOMPOSITION; STRAIN; THERMODYNAMIC STABILITY; TITANIUM NITRIDE; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; ZINC SULFIDE;

AGE HARDENING;

EID: 79961112093     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3610451     Document Type: Article

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