Depth profile of residual stress in metal-ion implanted TiN coatings

Surface and Coatings Technology

Volumn 92, Issue 1-2, 1997, Pages 135-141

  Rafaja, David ^a,c   Valvoda, Václav ^a   Perry, Anthony J ^b   Treglio, James R ^b  

^a CHARLES UNIVERSITY   (Czech Republic)

^b ISM Technologies Inc   (United States)

^c VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

Metal ion plantation; Residual stress; Titanium nitride coatings

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL LATTICES; ION IMPLANTATION; RESIDUAL STRESSES; TITANIUM NITRIDE; X RAY DIFFRACTION ANALYSIS;

GAUSSIAN DISTRIBUTION; GRAZING INCIDENCE X RAY DIFFRACTION;

CERAMIC COATINGS;

EID: 0031162437     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00013-3     Document Type: Article

References (17)

1. A.J. Perry, B.D. Sartwell, V. Valvoda, D. Rafaja, D.L. Williamson and A.J. Nelson, J. Vac. Sci. Technol. A., 10(4) (1992) 1446.
2. A.J. Perry, V. Valvoda, D. Rafaja, D.L. Williamson and B.D. Sartwell, Surf. Coat. Technol., 54/55 (1992) 180.
3. L.J. Liu, D.K. Sood, R.R. Manory and W. Zhou, Surf. Coat. Technol., 71 (1995) 159.
4. A.J. Perry, J.R. Treglio, V. Valvoda and D. Rafaja, J. Vac. Sci. Technol. A, 13(3) (1995) 1067.
5. R.R. Manory, L.J. Liu, D.K. Sood, Z.M. Shao, C. Kylner and M. Braun, Surf. Coat. Technol., 70 (1994) 1.
6. B. Gilles and M. Brunel, Nucl. Instrum. Methods Phys. Rev. B, 44 (1990) 331.
7. F. Pons, S. Megtert, J.C. Pivin, M. Pequignot, D. Mairey and C. Roques-Carmes, J. Appl. Cryst., 21 (1988) 197.
8. L. Hultman, B.-O. Johansson, J.-E. Sundgren, L.C. Markert and J.E. Greene, Appl. Phys. Lett., 53 (1988) 1175.
9. L. Hultman, J.-E. Sundgren, L.C. Markert and J.E. Greene, J. Vac. Sci. Technol. A, 7 (1989) 1187.
10. A.J. Perry, J.R. Treglio, J.P. Schaffer, J. Brunner, V. Valvoda and D. Rafaja, Surf. Coat Technol., 66 (1994) 377.
11. D.E. Geist, A.J. Perry, J.R. Treglio, V. Valvoda and D. Rafaja, Advances in X-ray Analysis, 38 (1995) 471.
12. H. Oettel, in J. Hašek (ed.), X-ray and Neutron Structure Analysis in Material Science, Plenum Publishing Company, New York, 1989, p. 171.
13. R. Delhez, Th.H. de Keijser, E.J. Mittemeijer, B.J. Thijsee, M.A. Hollanders, O.B. Loopstra and W.G. Sloof, Austr. J. Phys., 41 (1988) 261.
14. V. Valvoda, D. Rafaja, R. Černý and R. Kužel, Cryst. Res. Technol., 25(5) (1990) 553.
15. D. Rafaja, R. Kužel, V. Valvoda, A.J. Perry and J.R. Treglio, X-ray study of implanted TiN thin films, Proceedings of the ICMCTF96, San Diego, April 22-26, 1996.
16. S.N. Bunker and A.J. Armini, Nucl. Instrum. Methods B, 39 (1989) 7.
17. L.J. Liu, W. Zhou, D.K. Sood and R.R. Manory, Mater. Res. Soc. Symp. Proc., 279 (1993) 469.