Raman spectroscopy of thin-film silicon on woven polyester

Physica Status Solidi (A) Applications and Materials Science

Volumn 208, Issue 12, 2011, Pages 2765-2771

  Lind, Helena ^a   Wilson, John ^a   Mather, Robert ^b  

^a HERIOT WATT UNIVERSITY   (United Kingdom)

^b Upland House   (United Kingdom)

Author keywords

Raman spectroscopy; silicon thin films; woven polyester; wurtzite structure

Indexed keywords

A-SI:H; AMORPHOUS MATRICES; CHEMICAL VAPOUR DEPOSITION; DEPOSITION CONDITIONS; FILM STRUCTURE; HYDROGENATED AMORPHOUS SILICON (A-SI:H); INPUT POWER; RAMAN SPECTRUM; ROUGH SURFACES; SILICON THIN FILMS; SPECTRAL REGION; SUBSTRATE TEMPERATURE; TEXTILE SUBSTRATES; THIN FILM SILICON; TWO PHASE MIXTURES; WAVE NUMBERS; WURTZITE STRUCTURE;

AMORPHOUS FILMS; CHEMICAL VAPOR DEPOSITION; ESTERS; NANOCRYSTALLINE SILICON; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SCATTERING; RAMAN SPECTROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; TEXTILES; WEAVING; ZINC SULFIDE;

AMORPHOUS SILICON;

EID: 82055208480     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.201127148     Document Type: Article

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