Raman microspectroscopy study of processing-induced phase transformations and residual stress in silicon

Semiconductor Science and Technology

Volumn 14, Issue 10, 1999, Pages 936-944

  Gogotsi, Y ^a   Baek, C ^a   Kirscht, F ^b  

^a 1120 Science and Engineering Offices   (United States)

^b Mitsubishi Silicon America   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL POLISHING; COMPOSITION EFFECTS; MACHINING; METALLIZING; PHASE TRANSITIONS; RAMAN SPECTROSCOPY; RESIDUAL STRESSES; SCANNING; WEAR OF MATERIALS;

PROCESSING-INDUCED PHASE TRANSFORMATIONS; RAMAN MICROSPECTROSCOPY;

SILICON WAFERS;

EID: 0032594715     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/14/10/310     Document Type: Article

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