|
Volumn 42, Issue 8, 2003, Pages 4935-4942
|
Large Area Deposition of Polymorphous Silicon by Plasma Enhanced Chemical Vapor Deposition at 27.12 MHz and 13.56 MHz
|
Author keywords
Exodiffusion; Infrared spectroscopy; Nanostructured semiconductors; Optoelectronic and electronic thin film materials; Plasma diagnostics; Polymorphous semiconductors; Raman spectroscopy; Spectroscopic ellipsometry
|
Indexed keywords
DEPOSITION;
ELLIPSOMETRY;
INFRARED SPECTROSCOPY;
NANOSTRUCTURED MATERIALS;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
RAMAN SPECTROSCOPY;
THIN FILMS;
QUASI-ISOTHERMAL CONDITIONS;
SEMICONDUCTING SILICON;
|
EID: 0142023804
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.42.4935 Document Type: Article |
Times cited : (38)
|
References (29)
|