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Volumn 42, Issue 8, 2003, Pages 4935-4942

Large Area Deposition of Polymorphous Silicon by Plasma Enhanced Chemical Vapor Deposition at 27.12 MHz and 13.56 MHz

Author keywords

Exodiffusion; Infrared spectroscopy; Nanostructured semiconductors; Optoelectronic and electronic thin film materials; Plasma diagnostics; Polymorphous semiconductors; Raman spectroscopy; Spectroscopic ellipsometry

Indexed keywords

DEPOSITION; ELLIPSOMETRY; INFRARED SPECTROSCOPY; NANOSTRUCTURED MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; THIN FILMS;

EID: 0142023804     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.4935     Document Type: Article
Times cited : (38)

References (29)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.