SCOPUS 정보 검색 플랫폼

Volumn 258, Issue 5, 2011, Pages 1789-1796

Effect of substrate bias voltage on the structure, electric and dielectric properties of TiO 2 thin films by DC magnetron sputtering

(5) Chandra Sekhar, M a Kondaiah, P a Jagadeesh Chandra, S V a Mohan Rao, G b Uthanna, S a

a SRI VENKATESWARA UNIVERSITY (India)

b INDIAN INSTITUTE OF SCIENCE (India)

Author keywords

Dielectric constant; Leakage current; Optical properties; Sputtering; Structure

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS MATERIALS; CAPACITANCE; DIELECTRIC PROPERTIES OF SOLIDS; ENERGY GAP; HIGH-K DIELECTRIC; LEAKAGE CURRENTS; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; PERMITTIVITY; SILICA; SILICON OXIDES; SPECTROSCOPIC ANALYSIS; SPUTTERING; STRUCTURE (COMPOSITION); SUBSTRATES; THIN FILMS; TITANIUM DIOXIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

AC ELECTRICAL CONDUCTIVITY; CAPACITANCE VOLTAGE MEASUREMENTS; DC MAGNETRON SPUTTERING; DC MAGNETRON SPUTTERING TECHNIQUE; ELECTRIC AND DIELECTRIC PROPERTIES; ELECTRICAL AND OPTICAL PROPERTIES; RAMAN SPECTROSCOPIC STUDY; TITANIUM DIOXIDES (TIO2);

BIAS VOLTAGE;

EID: 81555219455 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2011.10.047 Document Type: Article

Times cited : (44)

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