Structural and electrical properties of TiO2 RF sputtered thin films

Materials Science and Engineering B: Solid-State Materials for Advanced Technology

Volumn 75, Issue 1, 2000, Pages 68-71

  Mardare, Diana ^a   Rusu, G I ^a  

^a ALEXANDRU IOAN CUZA UNIVERSITY OF IASI   (Romania)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ATOMIC FORCE MICROSCOPY; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY OF SOLIDS; GLASS; IRON; MOLECULAR STRUCTURE; MORPHOLOGY; NIOBIUM; SPUTTERING; THERMAL EFFECTS; THIN FILMS;

INVERSE TEMPERATURE;

TITANIUM DIOXIDE;

EID: 0033897958     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(00)00387-1     Document Type: Article

References (11)

1. Badawy W.A., Momtaz R.S., Elgiar E.M. Phys. Stat. Sol. (a). 118:1990;197.
2. Bally A.R., Korobeinikova E.N., Schmid P.E., Lévy F., Bussy F. J. Phys. D Appl. Phys. 31:1998;1149.
3. D. Mardare, M. Tasca, M. Delibas, G.I. Rusu, Appl. Surf. Sci. (1999).
4. Mardare D., Hones P. Mater. Sci. Eng. B68:1999;42.
5. Meng L.-J., Dos Santos M.P. Thin Solid Films. 226:1993;22.
6. Meng L.-J., Andritschky M., Dos Santos M.P. Thin Solid Films. 223:1993;242.
7. Suhail M.H., Mohan Rao G., Mohan S. J. Appl. Phys. 71:1992;1421.
8. Martin N., Rousselot C., Rondot D., Palmino F., Mercier R. Thin Solid Films. 300:1997;113.
9. Spurr R.A., Myers H. Anal. Chem. 29:1957;760.
10. Radecka M., Rekas M., Zakrzewska K. Solid State Phenomena. 113:1994;113.
11. Bernasik A., Radecka M., Rekas M., Sloma M. Appl. Surf. Sci. 65/66:1993;240.