Substrate bias voltage influenced structural, electrical and optical properties of dc magnetron sputtered Ta 2O 5 films

Journal of Materials Science: Materials in Electronics

Volumn 20, Issue 4, 2009, Pages 295-300

  Jagadeesh Chandra, S V ^a   Chandrasekhar, M ^a   Mohan Rao, G ^b   Uthanna, S ^a  

^a SRI VENKATESWARA UNIVERSITY   (India)

^b INDIAN INSTITUTE OF SCIENCE   (India)

Author keywords

[No Author keywords available]

Indexed keywords

APPLIED VOLTAGES; CHEMICAL BINDINGS; CRYSTALLINITY; DC REACTIVE MAGNETRON SPUTTERING; DIELECTRIC CONSTANTS; DIFFERENT SUBSTRATES; ELECTRICAL AND OPTICAL PROPERTIES; ELECTRICAL CHARACTERISTICS; GASES MIXTURES; GROWING FILMS; LEAKAGE CURRENT DENSITIES; OPTICAL BAND-GAP; OPTICAL TRANSMITTANCES; PACKING DENSITIES; POLY-CRYSTALLINE; QUARTZ SUBSTRATES; SILICON (111); STRUCTURED FILMS; SUBSTRATE BIAS VOLTAGES; TANTALUM OXIDES; TANTALUM TARGETS;

AMORPHOUS FILMS; AMORPHOUS MATERIALS; ARGON; BIAS VOLTAGE; CHEMICAL PROPERTIES; ENERGY GAP; INERT GASES; LIGHT REFRACTION; MAGNETRONS; OPTICAL BAND GAPS; OPTICAL PROPERTIES; OXIDE MINERALS; OXYGEN; QUARTZ; REFRACTIVE INDEX; REFRACTOMETERS; SUBSTRATES; TANTALUM; TANTALUM COMPOUNDS; TRANSITION METALS;

OPTICAL FILMS;

EID: 59749089272     PISSN: 09574522     EISSN: 1573482X     Source Type: Journal    
DOI: 10.1007/s10854-008-9723-0     Document Type: Article

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