Structural and electrochromic properties of TiO2 thin films prepared by metallorganic chemical vapor deposition

Thin Solid Films

Volumn 518, Issue 19, 2010, Pages 5457-5462

  Khalifa, Z S ^a,b   Lin, H ^b   Ismat Shah, S ^b  

^a BENI SUEF UNIVERSITY   (Egypt)

^b UNIVERSITY OF DELAWARE   (United States)

Author keywords

Metallorganic Chemical Vapor Deposition; Photochromic property; Thin films; Titanium dioxide; Voltammetry; X ray diffraction

Indexed keywords

ANATASE STRUCTURES; BAND GAPS; C FILMS; CHRONOAMPEROMETERY; CORE LEVELS; CRYSTALLINITIES; DEPOSITION TEMPERATURES; ELECTROCHROMIC PERFORMANCE; ELECTROCHROMIC PROPERTIES; IN-SITU; INDIUM TIN OXIDE COATED GLASS; ION STORAGE; OPTICAL MODULATION; PHOTOCHROMIC PROPERTIES; REDUCTION OF TI; SODA LIME GLASS; SUBSTRATE TEMPERATURE; TIO; TITANIUM DIOXIDE THIN FILM; X-RAY DIFFRACTION STUDIES;

BINDING ENERGY; DEPOSITION; DIFFRACTION; ELECTROCHROMISM; GLASS; INDIUM COMPOUNDS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; ORGANOMETALLICS; OXIDE FILMS; PHOTOCHROMISM; SUBSTRATES; THIN FILMS; TIN; TIN DIOXIDE; TIN OXIDES; TITANIUM; TITANIUM DIOXIDE; TITANIUM OXIDES; VAPOR DEPOSITION; VOLTAMMETRY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY; X RAYS;

FILM PREPARATION;

EID: 77955652685     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.04.013     Document Type: Article

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