The microstructure and X-ray reflectivity of Mo/Si multilayers

Thin Solid Films

Volumn 415, Issue 1-2, 2002, Pages 123-132

  Andreev, S S ^a   Gaponov, S V ^a   Gusev, S A ^a   Haidl, M N ^b   Kluenkov, E B ^a   Prokhorov, K A ^a   Polushkin, N I ^a   Sadova, E N ^a   Salashchenko, N N ^a   Suslov, L A ^a   Zuev, S Yu ^a  

^a INSTITUTE FOR PHYSICS OF MICROSTRUCTURES   (Russian Federation)

^b CARL ZEISS SMT AG   (Germany)

Author keywords

Molybdenum; Multilayers; Sputter deposition; Transmission electron microscopy

Indexed keywords

MICROSTRUCTURE; MOLYBDENUM; REFLECTION; SEMICONDUCTING SILICON; SPUTTER DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY; X RAYS;

X-RAY REFLECTIVITY;

MULTILAYERS;

EID: 0036672239     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00536-9     Document Type: Article

References (27)