Analysis of multilayer structure for reflection of extreme-ultraviolet wavelength

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 6 B, 2002, Pages 4086-4090

  Lee, Seung Yoon ^a   Hur, Sung Min ^a   Kim, Hyung Joon ^a   Yoon, Chong Seung ^a   Lee, Young Tae ^a   Kang, In Yong ^b   Chung, Yong Chae ^a   Yi, Moonsuk ^c   Bok, Cheol Kyu ^d   Kim, Ohyun ^a   Ahn, Jinho ^a  

^a Hanyang University   (South Korea)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^c Hynix Semiconductor Inc   (South Korea)

^d Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

d spacing; EUVL; Mo Si; Multilayer; NGL; Reflectivity

Indexed keywords

LIGHT REFLECTION; MIRRORS; MULTILAYERS; SPUTTERING; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

EXTREME ULTRAVIOLET (EUV) REFLECTORS;

ULTRAVIOLET RADIATION;

EID: 0036613993     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.4086     Document Type: Article

References (13)