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Volumn 268, Issue 3-4, 2010, Pages 334-340

Total pattern fitting for the combined size-strain-stress-texture determination in thin film diffraction

Author keywords

Reflectivity; Residual stress; Texture; Thin film; X ray diffraction

Indexed keywords

CHEMICAL CONCENTRATIONS; EPITAXIAL THIN FILMS; MICROSTRAINS; MULTIPLE DATA; PATTERN FITTING; QUANTITATIVE PHASE ANALYSIS; REFLECTIVITY; THEORETICAL POINTS; THICKNESS DETERMINATION; THIN FILM X-RAY DIFFRACTIONS; THIN-FILM STRUCTURE; TOTAL X-RAY FLUORESCENCES;

EID: 75949101985     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2009.09.053     Document Type: Article
Times cited : (1011)

References (31)
  • 13
    • 75949089608 scopus 로고    scopus 로고
    • L. Lutterotti, Acta Cryst. A, 56 (s1) (2000) s54.
    • L. Lutterotti, Acta Cryst. A, 56 (s1) (2000) s54.
  • 16
    • 75949107451 scopus 로고    scopus 로고
    • PhD thesis, University of Trento
    • M. Bortolotti, PhD thesis, University of Trento, 2007.
    • (2007)
    • Bortolotti, M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.