|
Volumn 268, Issue 3-4, 2010, Pages 334-340
|
Total pattern fitting for the combined size-strain-stress-texture determination in thin film diffraction
|
Author keywords
Reflectivity; Residual stress; Texture; Thin film; X ray diffraction
|
Indexed keywords
CHEMICAL CONCENTRATIONS;
EPITAXIAL THIN FILMS;
MICROSTRAINS;
MULTIPLE DATA;
PATTERN FITTING;
QUANTITATIVE PHASE ANALYSIS;
REFLECTIVITY;
THEORETICAL POINTS;
THICKNESS DETERMINATION;
THIN FILM X-RAY DIFFRACTIONS;
THIN-FILM STRUCTURE;
TOTAL X-RAY FLUORESCENCES;
CRYSTAL STRUCTURE;
DIFFRACTION GRATINGS;
DIFFRACTION PATTERNS;
EPITAXIAL FILMS;
FILM PREPARATION;
HOLOGRAPHIC INTERFEROMETRY;
MULTILAYERS;
REFLECTION;
RESIDUAL STRESSES;
TEXTURES;
THIN FILM DEVICES;
X RAY DIFFRACTION;
X RAY DIFFRACTION ANALYSIS;
|
EID: 75949101985
PISSN: 0168583X
EISSN: None
Source Type: Journal
DOI: 10.1016/j.nimb.2009.09.053 Document Type: Article |
Times cited : (1011)
|
References (31)
|