Growth of narrow and straight germanium nanowires by vapor-liquid-solid chemical vapor deposition

Japanese Journal of Applied Physics

Volumn 50, Issue 10 PART 1, 2011, Pages

  Simanullang, Marolop ^a   Usami, Koichi ^a   Kodera, Tetsuo ^a   Uchida, Ken ^a   Oda, Shunri ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AU NANOPARTICLE; GERMANIUM NANOWIRES; GROWTH CONDITIONS; SUBSTRATE TEMPERATURE; SYSTEMATIC STUDY; VAPOR-LIQUID-SOLID; VAPOR-LIQUID-SOLID MECHANISM;

FIELD EFFECT TRANSISTORS; GERMANIUM; GOLD; GROWTH TEMPERATURE; LIQUIDS; NANOWIRES; VAPORS;

CHEMICAL VAPOR DEPOSITION;

EID: 80054923182     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.50.105002     Document Type: Article

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