Spectrally selective Al/AlN/Al/AlN tandem solar absorber by inline reactive ac magnetron sputtering

Surface Engineering

Volumn 27, Issue 8, 2011, Pages 616-622

  Chen, C W ^a,b   Chen, D Y ^c   Hsu, C Y ^b   Chang, Y H ^b   Hou, K H ^a  

^a CHANG GUNG UNIVERSITY   (Taiwan)

^b LUNGHWA UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

^c HWA HSIA INSTITUTE OF TECHNOLOGY   (Taiwan)

Author keywords

Absorptance; Aluminium nitride; Emittance; Multilayer; Selective absorbers

Indexed keywords

ABSORPTANCE; AC POWER; DEPOSITION CONDITIONS; DEPOSITION PROCESS; DIFFERENT PROCESS; EMITTANCES; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; GLASS SUBSTRATES; IN-LINE; LOW EMITTANCE; OPTICAL PERFORMANCE; REACTIVE ATMOSPHERES; SELECTIVE ABSORBERS; SELECTIVE COATINGS; SODA LIME GLASS SUBSTRATE; SOLAR ABSORPTANCE; SPUTTERING PARAMETERS; STRUCTURAL FEATURE; SUBSTRATE MOVEMENT; THERMAL EMITTANCE;

ALUMINUM COMPOUNDS; FIELD EMISSION MICROSCOPES; GLASS; MULTILAYER FILMS; MULTILAYERS; NITRIDES; OPTICAL MULTILAYERS; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

SOLAR ABSORBERS;

EID: 80054741811     PISSN: 02670844     EISSN: 17432944     Source Type: Journal    
DOI: 10.1179/026708410X12786785573436     Document Type: Article

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