SCOPUS 정보 검색 플랫폼

Volumn 24, Issue 5, 2008, Pages 319-321

Current developments in ionised physical vapour deposition by magnetron sputtering - State of the art - Prospects for the future in terms of applications

(1) Tessier, P Y a

a UNIVERSITÉ DE NANTES (France)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC FIELDS; FILM GROWTH; INTERFACES (MATERIALS); IONIZATION; MAGNETRON SPUTTERING; METAL IONS; METALS; MOLECULAR BEAM EPITAXY; PHYSICAL VAPOR DEPOSITION; RESIDUAL STRESSES;

COMPRESSIVE RESIDUAL STRESS; EMERGING APPLICATIONS; INTERFACE ADHESION; INTERFACE ENGINEERING; ION-ASSISTED DEPOSITION; IONISED PHYSICAL VAPOUR DEPOSITIONS; IONIZED PHYSICAL VAPOR DEPOSITION; SUBSTRATE PRETREATMENT;

ION BEAM ASSISTED DEPOSITION;

EID: 51749119855 PISSN: 02670844 EISSN: None Source Type: Journal
DOI: 10.1179/174329408X3268 Document Type: Review

Times cited : (3)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.