High deposition rate magnetrons: Key elements and advantages

Surface Engineering

Volumn 22, Issue 1, 2006, Pages 5-10

  Mitin, V S ^a   Sharipov, E I ^a   Mitin, A V ^a  

^a Centre Science Knowledge Technological and Social Innovations (NETSI)   (Russian Federation)

Author keywords

High deposition rate magnetrons; Ion plasma; Sputtering; Vacuum deposition

Indexed keywords

CHEMICAL INDUSTRY; COATING TECHNIQUES; PHYSICAL VAPOR DEPOSITION; THERMAL EFFECTS; VACUUM DEPOSITED COATINGS;

HIGH DEPOSITION RATE MAGNETRONS; ION PLASMA; VACUUM DEPOSITION;

MAGNETRON SPUTTERING;

EID: 33746256447     PISSN: 02670844     EISSN: None     Source Type: Journal    
DOI: 10.1179/174329406X85038     Document Type: Article

References (14)

1. P. Kelly and R. Arnell: Vacuum, 2000, 56, 159-172.
2. G. Kienel, B. Meyer and W. Munz: Vacuumtechnik. 1981, 30, 236-246.
3. S. Yang and D. Teer: Surf. Coat. Technol., 2000, 131, 412-416.
4. D. Teer: UK Patent No. 2258343; USA Patent No. 5554519: European Patent No 0521045.
5. W. Munz and G. Hessberger: US Patent No. 4426267 C1.
6. W. Munz, D. Hoffman and K. Harting: Thin Solid Films, 1982, 96, 79.
7. I. A. Raich, L. N. Koltunova and S. N. Fedosov: Mashinostroenie, 1976, 368.
8. A. Fenerstein, W. Dietrch and H. Stephan: Vac. Tech., 1984, 50, 417-423.
9. N. N. Rykalin, A. A. Uglov and A. N. Kokora: Mashinostroenie, 1975, 296.
10. V. P. Sinev: Fisika i khimija obrabotki materialov. 1978, (4), 136-142.
11. H. Stephan, W. Dietrich, A. Fenerstein and O. Hoffmann: Metall, 1981, 35, 427-431.
12. S. Schiller, V. Heising and K. Goedike: Vakuum-Technik. 1978, 21, (1), 51.
13. V. Mitin et al.: Russia Patent No. 2131626, August 1996.
14. V. Mitin el al.: Russia Patent No. 2210620. August 2003.