Generalized inverse lithography methods for phase-shifting mask design

Optics Express

Volumn 15, Issue 23, 2007, Pages 15066-15079

  Ma, Xu ^a   Arce, Gonzalo R ^a  

^a UNIVERSITY OF DELAWARE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GEOMETRY; OPTIMIZATION; PATTERN RECOGNITION; PHASE SHIFT; PROBLEM SOLVING; SEMICONDUCTOR DEVICE MANUFACTURE;

INVERSE LITHOGRAPHY; OPTICAL PROXIMITY CORRECTION (OPC); PATTERN FIDELITY; PHASE SHIFTING MASKS (PSM);

MASKS;

EID: 36248959248     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.15.015066     Document Type: Article

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