Generalized formulations for aerial image based lens aberration metrology in lithographic tools with arbitrarily shaped illumination sources

Optics Express

Volumn 18, Issue 19, 2010, Pages 20096-20104

  Liu, Wei ^a   Liu, Shiyuan ^b   Shi, Tielin ^a   Tang, Zirong ^a  

^a HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^b HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CAMERA LENSES; LENSES; OPTICAL INSTRUMENTS; PHOTOLITHOGRAPHY; UNDERWATER ACOUSTICS;

ABERRATION SENSITIVITY; AERIAL IMAGES; CRITICAL DIMENSION CONTROL; HIGH ORDER; ILLUMINATION SOURCES; IMAGING QUALITY; IN-LINE MONITORING; IN-SITU MEASUREMENT; INTENSITY DISTRIBUTION; LENS ABERRATION; LITHOGRAPHIC TOOLS; OPTICAL LITHOGRAPHY; PARTIALLY COHERENT IMAGING; PHYSICAL SIGNAL; POTENTIAL APPLICATIONS; PROLITH; SEMICONDUCTOR MANUFACTURING; SENSITIVITY FUNCTIONS; SHAPED ILLUMINATION; SOURCE DISTRIBUTION; WAVEFRONT ABERRATIONS; ZERNIKE; ZERNIKE COEFFICIENT;

ABERRATIONS;

ARTICLE; ARTIFACT; COMPUTER AIDED DESIGN; EQUIPMENT; EQUIPMENT DESIGN; ILLUMINATION; INSTRUMENTATION; PHOTOGRAPHY; REPRODUCIBILITY; SENSITIVITY AND SPECIFICITY;

ARTIFACTS; COMPUTER-AIDED DESIGN; EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; LIGHTING; PHOTOGRAPHY; REPRODUCIBILITY OF RESULTS; SENSITIVITY AND SPECIFICITY;

EID: 77957004416     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.18.020096     Document Type: Article

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