Metrology of replicated diffractive optics with Mueller polarimetry in conical diffraction

Optics Express

Volumn 15, Issue 5, 2007, Pages 2033-2046

  Novikova, Tatiana ^a   De Martino, Antonello ^a   Bulkin, Pavel ^a   Nguyen, Quang ^a   Drévillon, Bernard ^a   Popov, Vladimir ^b   Chumakov, Alexander ^b  

^a LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

^b MOSCOW STATE UNIVERSITY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHROMIUM; HOLOGRAPHIC GRATINGS; MEASUREMENT THEORY; NICKEL; POLARIMETERS;

AZIMUTHAL ANGLES; CONICAL DIFFRACTION; MUELLER MATRIX COEFFICIENTS; MUELLER POLARIMETRY;

DIFFRACTIVE OPTICS;

EID: 33847759871     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.15.002033     Document Type: Article

References (16)

1. M. Gale, "Replicated Diffractive Optics and Micro-Optics,". Optics and Photonic News, 24-29, August (2003).
2. A. De Martino, Y.K. Kim, E. Garcia-Caurel, B. Laude, and B. Drévillon, ''Optimized Mueller polarimeter with liquid crystals", Opt. Lett. 28, 616-618 (2003).
3. B. K. Minhas, S. A. Coulombe, S. S. H. Naqvi, and John R. McNeil, "Ellipsometric scatterometry for the metrology of Sub-0.1-μm-linewidth structures", Appl. Opt. 37, 5112-5115 (1998).
4. Y. -S. Ku, S. -C. Wang, D. -M. Shyu, and N. Smith, "Scatterometry- based metrology with feature region signatures matching", Opt. Express 14, 8482-8491 (2006).
5. H.-T. Huang, W. Kong, and F. L. Terry, Jr. "Normal-incidence spectroscopic ellipsometry for critical dimension monitoring", Appl. Phys. Lett. 78, 3983-3985 (2001).
6. T. Novikova, A. De Martino, R. Ossikovski, and B. Drévillon, "Metrological applications of Mueller polarimetry in conical diffraction for overlay characterization in microelectronics", Eur. Phys. J. Appl. Phys. 31, 63-69 (2005).
7. T. Novikova, A. De Martino, S. Ben Hatit, and B. Drévillon, "Application of Mueller polarimetry in conical diffraction for critical dimension measurements in microelectronics", Appl. Opt. 45, 3688-3697 (2006)
8. A. De Martino, T. Novikova, Ch. Arnold, S. BenHatit, and B. Drévillon, "Decorrelation of fitting parameters by Mueller polarimetry in conical diffraction" in Metrology, Inspection, and Process Control for Microlithogmphy XX, Chas N. Archie, ed., Proc. SPIE 6152, 530-541, (2006).
9. A. De Martino, E. Garcia-Caurel, B. Laude, and B. Drévillon, "General methods for optimized design and calibration of Mueller polarimeters", Thin Solid Films, 455-456, 112-119, (2004).
10. CompOptics Ltd., http://www.compoptics.ru/.
11. S.Yu. Serezhnikov. "Preparation, treatment and visualization of data for the fabrication of holograms using electron beam system ZB A-21", Numerical Methods and Programming, 3, 110-115 (2002) (in Russian).
12. M.G. Moharam, E.B. Grann, D.A. Pommet, T.K. Gaylord, "Formulation for stable and efficient implementation of the rigorous coupled-wave analysis of binary gratings", J. Opt. Soc. Am. A 12, 1068-1076 (1995).
13. L. Li, "Formulation and comparison of two recursive matrix algorithms for modeling layered diffraction gratings", J. Opt. Soc. Am. A 13, 1024-1035 (1996).
14. P. Lalanne and G. M. Morris, "Highly improved convergence of the coupled-wave method for TM polarization" J. Opt. Soc. Am. A 13, 779-784 (1996)
15. L. Li. Use of Fourier series in the analysis of discontinuous periodic structures. J. Opt. Soc. Am. A 13, 1870-1876 (1996).
16. L. Li. Symmetries of cross-polarization diffraction coefficients of gratings, J. Opt. Soc. Am. A 17, 881-887 (2000).