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Volumn 7155, Issue , 2008, Pages

Model-free and Model-based methods for dimensional metrology during the lifetime of a product

Author keywords

Early development phase; Inline metrology; Model based dimensional metrology; Model free dimensional metrology; Volume production

Indexed keywords

LIGHT MEASUREMENT; MEASUREMENTS; TECHNOLOGICAL FORECASTING;

EID: 57549095771     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814534     Document Type: Conference Paper
Times cited : (5)

References (9)
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    • Heidelberg, A., Wu, X., Philipp, S., Weidner, P., Kücher, P., BloeB, H., AFM tips for 58nm and smaller node applications, Frontiers of characterization and metrology for nanoelectronics, Seiler, D. G., Diebold, A. C, McDonald, R., Garner, CM., Herr, D., Khosla, R.P., Secula, E.M. (eds.), 545 (2007).
    • Heidelberg, A., Wu, X., Philipp, S., Weidner, P., Kücher, P., BloeB, H., "AFM tips for 58nm and smaller node applications", Frontiers of characterization and metrology for nanoelectronics, Seiler, D. G., Diebold, A. C, McDonald, R., Garner, CM., Herr, D., Khosla, R.P., Secula, E.M. (eds.), 545 (2007).
  • 3
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    • Deep trench metrology challenges for 75 nm DRAM technology
    • 32nd edition
    • Weidner, P., Kasic, A. Hingst, T., & Lindner, T., "Deep trench metrology challenges for 75 nm DRAM technology", Semiconductor Fabtech, 32nd edition, 115.
    • Semiconductor Fabtech , pp. 115
    • Weidner, P.1    Kasic, A.2    Hingst, T.3    Lindner, T.4
  • 6
    • 35348877314 scopus 로고    scopus 로고
    • Measuring trench structures for microelectronics with model- based infrared reflectometry
    • Seiler, D.G, Diebold, A. C, McDonald, R, Garner, C.M, Herr, D, Khosla, R.P, Secula, E.M, eds
    • Maznev, A.A, Mazurenko, A., Duran, C., Gostein, M., "Measuring trench structures for microelectronics with model- based infrared reflectometry", Frontiers of characterization and metrology for nanoelectronics, Seiler, D.G., Diebold, A. C., McDonald, R., Garner, C.M., Herr, D., Khosla, R.P., Secula, E.M. (eds.), 74 (2007).
    • (2007) Frontiers of characterization and metrology for nanoelectronics , pp. 74
    • Maznev, A.A.1    Mazurenko, A.2    Duran, C.3    Gostein, M.4
  • 7
    • 0029306568 scopus 로고
    • Stable implementation of the rigorous coupled-wave analysis for surface-relief gratings: Enhanced transmittance matrix approach
    • Moharam, M.G., Pommet, A.P., Grann, E.P., Gaylord, T.K., "Stable implementation of the rigorous coupled-wave analysis for surface-relief gratings: enhanced transmittance matrix approach", J. Opt. Soc. Am. A 12(5), 1080 (1995).
    • (1995) J. Opt. Soc. Am. A , vol.12 , Issue.5 , pp. 1080
    • Moharam, M.G.1    Pommet, A.P.2    Grann, E.P.3    Gaylord, T.K.4
  • 8
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    • A quantitative investigation of the benefits of feed-forward applied to CD scatterometry measurements of complex structures
    • Morris, S.J., "A quantitative investigation of the benefits of feed-forward applied to CD scatterometry measurements of complex structures", 6th European AEC/APC conference (2005).
    • (2005) 6th European AEC/APC conference
    • Morris, S.J.1
  • 9
    • 33745611744 scopus 로고    scopus 로고
    • Improved profile measurement accuracy via feed-forward spectroscopic ellipsometry
    • Peters, R., Lakkapragada, S., "Improved profile measurement accuracy via feed-forward spectroscopic ellipsometry", Proceedings of SPIE volume 6152, 615221 (2006).
    • (2006) Proceedings of SPIE , vol.6152 , pp. 615221
    • Peters, R.1    Lakkapragada, S.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.