Effect of analysis direction on the measurement of interfacial mixing in thin metal layers with atom probe tomography

Ultramicroscopy

Volumn 111, Issue 6, 2011, Pages 506-511

  Larson, D J ^a,b   Prosa, T J ^b   Geiser, B P ^b   Egelhoff, Jr ^c  

^a UNIVERSITY OF OXFORD   (United Kingdom)

^b CAMECA   (United States)

^c NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

Atom probe tomography; Chemical intermixing; Thin films

Indexed keywords

ATOMS; COBALT; FILM GROWTH; FILM PREPARATION; PROBES; THIN FILMS;

ACCURACY AND PRECISION; ATOM PROBE TOMOGRAPHY; FIELD EVAPORATION; GROWTH DIRECTIONS; INTERFACIAL MIXING; MULTILAYER STRUCTURES; RECONSTRUCTION ALGORITHMS; THIN METAL LAYERS;

MIXING;

COBALT; COPPER;

ALGORITHM; ARTICLE; ATOM PROBE TOMOGRAPHY; CONTROLLED STUDY; EVAPORATION; FILM; INTERFACIAL MIXING; PHYSICAL PHENOMENA; SIMULATION; THICKNESS; TOMOGRAPHY;

EID: 80052548710     PISSN: 03043991     EISSN: 18792723     Source Type: Journal    
DOI: 10.1016/j.ultramic.2010.12.010     Document Type: Article

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