Nanomechanical properties of sputter-deposited HfO2 and Hf xSi1-xO2 thin films

Journal of Applied Physics

Volumn 110, Issue 4, 2011, Pages

  Venkatachalam, D K ^a   Bradby, J E ^a   Saleh, M N ^a   Ruffell, S ^a   Elliman, R G ^a  

^a AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

AS-DEPOSITED FILMS; NANOMECHANICAL PROPERTY; ROOM TEMPERATURE;

ELASTIC MODULI; HAFNIUM; HARDNESS; NANOINDENTATION; PHASE SEPARATION; SILICON; SILICON COMPOUNDS;

HAFNIUM OXIDES;

EID: 80052396471     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3627155     Document Type: Article

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