Amorphous hafnium silicates: structural, electronic and dielectric properties

Microelectronic Engineering

Volumn 84, Issue 9-10, 2007, Pages 2416-2419

  Broqvist, Peter ^a   Pasquarello, Alfredo ^a  

^a INSTITUT ROMAND DE RECHERCHE NUMÉRIQUE EN PHYSIQUE DES MATÉRIAUX IRRMA   (Switzerland)

Author keywords

Dielectric constants; Electronic band gaps; Hafnium silicates

Indexed keywords

ELECTRIC FIELDS; ENERGY GAP; MOLECULAR DYNAMICS; PERMITTIVITY;

FINITE ELECTRIC FIELD; HAFNIUM SILICATES; PAIR DISTRIBUTION FUNCTIONS;

HAFNIUM COMPOUNDS;

EID: 34249038462     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.04.013     Document Type: Article

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