Microscopic model for the nonlinear behavior of high- k metal-insulator-metal capacitors

Journal of Applied Physics

Volumn 103, Issue 10, 2008, Pages

  Wenger, Ch ^a   Lupina, G ^a   Lukosius, M ^a   Seifarth, O ^a   Mussig H J ^a   Pasko, S ^b   Lohe, Ch ^b  

^a IHP   (Germany)

^b AIXTRON AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; CONTROL NONLINEARITIES; COULOMB INTERACTIONS; ELECTROSTRICTION; MATHEMATICAL MODELS; MIM DEVICES; VOLTAGE MEASUREMENT;

CAPACITANCE VOLTAGE LINEARITY; METAL INSULATOR METAL (MIM) CAPACITORS;

CAPACITORS;

EID: 44649155667     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2919573     Document Type: Article

References (23)

1. RF and Analog/Mixed-Signal Technologies for Wireless Communications, International Roadmap for Semiconductors (Semiconductor Industry Association, Palo Alto, 2006).
2. S. Blonkowski, M. Regache, and A. Halimaoui, J. Appl. Phys. 0021-8979 10.1063/1.1381043 90, 1501 (2001).
3. C. Zhu, H. Hu, X. Yu, S. J. Kim, A. Chin, M. F. Li, B. J. Cho, and D. L. Kwong, Tech. Dig.-Int. Electron Devices Meet. 2003, 879.
4. F. El Kamel, P. Gonon, and C. Vallee, Appl. Phys. Lett. 0003-6951 10.1063/1.2803221 91, 172909 (2007).
5. P. Gonon and C. Vallee, Appl. Phys. Lett. 0003-6951 10.1063/1.2719618 90, 142906 (2007).
6. S. Becu, S. Cremer, and J. -L. Autran, Appl. Phys. Lett. 0003-6951 10.1063/1.2170137 88, 052902 (2006).
7. S. Blonkowski, Appl. Phys. Lett. 0003-6951 10.1063/1.2800291 91, 172903 (2007).
8. T. -H. Perng, C. -H. Chien, C. -W. Chen, P. Lehnen, and C. -Y. Chang, Thin Solid Films 469-470, 345 (2004).
9. R. E. Newnham, V. Sundar, R. Yimnirun, J. Su, and Q. M. Zhang, J. Phys. Chem. B 1089-5647 10.1021/jp971522c 101, 10141 (1997).
10. R. A. Anderson, Phys. Rev. B 0163-1829 10.1103/PhysRevB.33.1302 33, 1302 (1986).
11. I. Krakovsky, T. Romijn, and A. Posthuma de Boer, J. Appl. Phys. 0021-8979 10.1063/1.369418 85, 628 (1999).
12. Y. M. Shkel and D. J. Klingenberg, J. Appl. Phys. 0021-8979 10.1063/1.363439 80, 4566 (1996).
13. R. G. Munro," Elastic Moduli Data for Polycrystalline Ceramics.," Report No. NISTIR 6853, 2002.
14. R. Adair, L. L. Chase, and S. A. Payne, Phys. Rev. B 0163-1829 10.1103/PhysRevB.39.3337 39, 3337 (1989).
15. J. A. Duffy, Phys. Chem. Glasses 30, 1 (1989).
16. V. Dimitrov and S. Sakka, J. Appl. Phys. 0021-8979 10.1063/1.360963 79, 1741 (1996).
17. J. Robertson, Rep. Prog. Phys. 0034-4885 10.1088/0034-4885/69/2/R02 69, 327 (2006).
18. R. A. Garaev, D. V. Vlasov, and V. V. Korobkin, Sov. J. Quantum Electron. 12, 100 (1982).
19. G. Logothetidis, E. I. Meletis, G. Stergioudis, and A. A. Adjaotter, Thin Solid Films 0040-6090 10.1016/S0040-6090(98)00975-4 338, 304 (1999).
20. F. Esaka, K. Furuya, H. Shimada, M. Imamura, M. Matsubayashi, H. Sato, A. Nishijima, A. Kawana, H. Ichimura, and T. Kikuchi, J. Vac. Sci. Technol. A 0734-2101 10.1116/1.580764 15, 2521 (1997).
21. T. Schroeder, G. Lupina, R. Sohal, G. Lippert, Ch. Wenger, O. Seifarth, M. Tallarida, and D. Schmeisser, J. Appl. Phys. 0021-8979 10.1063/1.2749468 102, 014103 (2007).
22. S. H. Mohamed, O. Kappertz, T. Niemeier, R. Drese, M. M. Wakkad, and M. Wuttig, Thin Solid Films 0040-6090 10.1016/j.tsf.2004.04.017 468, 48 (2004).
23. V. Sundar and R. E. Newnham, J. Mater. Sci. Lett. 0261-8028 10.1007/BF00271325 13, 799 (1994).