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Journal of Nano- and Electronic Physics

Volumn 3, Issue 1 PART3, 2011, Pages 590-600

Nanostructured hydrogenated silicon films by hot-wire chemical vapor deposition: The influence of substrate temperature on material properties

(7) Waman, V S a Kamble, M M a Pramod, M R a Funde, A M a Sathe, V G b Gosavi, S W b Jadkar, S R a

a UNIVERSITY OF PUNE (India)

b UGC DAE CONSORTIUM FOR SCIENTIFIC RESEARCH (India)

Author keywords

Electrical properties; Hot wire chemical vapor deposition; Nanocrystalline silicon thin films; Optical properties; Structural properties

Indexed keywords

EID: 80052139035 PISSN: 20776772 EISSN: None Source Type: Journal
DOI: None Document Type: Article

Times cited : (13)

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