Nanocrystalline silicon film grown by LEPECVD for photovoltaic applications

Solar Energy Materials and Solar Cells

Volumn 87, Issue 1-4, 2005, Pages 11-24

  Acciarri, M ^a   Binetti, S ^a   Bollani, M ^a   Comotti, A ^a   Fumagalli, L ^a   Pizzini, S ^a   Von Kanel H ^b  

^a UNIVERSITY OF MILANO BICOCCA   (Italy)

^b POLITECNICO DI MILANO   (Italy)

Author keywords

Chemical vapour deposition; Nanocrystalline; Properties

Indexed keywords

AMORPHOUS MATERIALS; FILM GROWTH; NANOSTRUCTURED MATERIALS; PHOTOVOLTAIC EFFECTS; SILANES; SILICON;

AMORPHOUS MATRIX; CRYSTALLINITY; DEPOSITION PARAMETERS; PROPERTIES;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 17744379427     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2004.09.012     Document Type: Conference Paper

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