Microstructure of poly-Si thin films prepared at low temperatures

Solar Energy Materials and Solar Cells

Volumn 62, Issue 1, 2000, Pages 109-115

  Zhu, M ^a,b   Cao, Y ^a,b   Guo, X ^a,b   Liu, J ^a,b   He, M ^c   Sun, K ^c  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

^b INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

^c DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL MICROSTRUCTURE; DISSOLUTION; ELECTRON DIFFRACTION; FILM PREPARATION; HYDROGEN; NANOSTRUCTURED MATERIALS; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON; THIN FILMS;

HOT WIRE CHEMICAL VAPOR DEPOSITION (HWCVD);

SOLAR CELLS;

EID: 0033890933     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(99)00141-5     Document Type: Article

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