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Volumn 7640, Issue , 2010, Pages

Evaluation of double-patterning techniques for advanced logic nodes

Author keywords

CD Optimizer; CD uniformity; defectivity; DoseMapper; Double Patterning; GridMapper; overlay; pitch splitting

Indexed keywords

LITHOGRAPHY;

EID: 80052066318     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.846769     Document Type: Conference Paper
Times cited : (16)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.