Combinatorial overlay control for double patterning

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 8, Issue 1, 2009, Pages

  Ausschnitt, Christopher P ^a   Halle, Scott D ^a  

^a IBM RESEARCH   (United States)

Author keywords

Blossom metrology; Double patterning; Lithography; Overlay control

Indexed keywords

BLOSSOM METROLOGY; CRITICAL LEVEL; DOUBLE PATTERNING; FIELD OF VIEWS; MEASUREMENT TOOLS; OVERLAY CONTROL; OVERLAY TOLERANCES; PRODUCT OVERLAY; REFERENCE LAYER; SIMULTANEOUS DETERMINATIONS;

PHOTOLITHOGRAPHY;

EID: 79956086153     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.3023079     Document Type: Article

References (10)

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