Process capability comparison between LELE DPT and spacer for NAND flash 32nm and below

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7140, Issue , 2008, Pages

  Tseng, Shih En ^a   Chen, Alek C ^a  

^a ASML Taiwan Ltd   (Taiwan)

Author keywords

CD uniformity; Double patterning technology (DPT); Litho etch litho etch (LELE); NAND Flash

Indexed keywords

CD UNIFORMITY; DOUBLE PATTERNING TECHNOLOGY (DPT); ERROR BUDGETS; FILM DEPOSITIONS; GATE LAYERS; LITHO-ETCH-LITHO-ETCH (LELE); MULTIPLE FEATURES; NAND FLASH; OVERLAY ERRORS; PARAMETER VARIATIONS; PATTERN SENSITIVITIES; PROCESS CAPABILITIES; PROCESS FLOWS; SIMULATION EVALUATIONS;

BUDGET CONTROL; PRODUCTION ENGINEERING; SENSITIVITY ANALYSIS; TITRATION;

SCANNING;

EID: 62449296507     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.808003     Document Type: Conference Paper

References (9)

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