Engine for characterization of defects, overlay and critical dimension control for double exposure processes for advanced logic nodes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7273, Issue , 2009, Pages

  Holmes, Steven ^a   Koay, Chiew Seng ^a   Petrillo, Karen ^a   Chen, Kuang Jung ^a   Colburn, Matthew E ^a   Cantone, Jason ^b   Ueda, Kenichi ^b   Metz, Andrew ^c   Dunn, Shannon ^c   Van Dommelen, Youri ^d   Crouse, Michael ^d   Galloway, Judy ^d   Schmitt Weaver, Emil ^d   Jiang, Aiqin ^d   Routh, Robert ^d   Tang, Cherry ^e   Slezak, Mark ^f   Kini, Sumanth ^g   Dibiase, Tony ^g  

^a IBM   (United States)

^b TOKYO ELECTRON AMERICA INC   (United States)

^c TEL TECHNOLOGY CENTER   (United States)

^d ASML US Inc   (United States)

^e JSR Micro Inc   (United States)

^f JSR Micro   (United States)

^g KLA   (United States)

Author keywords

Detectivity; Double patterning; Overlay; Pitch split

Indexed keywords

ALTERNATIVE METHODS; CRITICAL DIMENSION CONTROL; DEFECTIVITY; DETECTIVITY; DOUBLE EXPOSURE; DOUBLE PATTERNING; LITHOGRAPHIC DIMENSIONS; LOGIC NODES; NUMERICAL APERTURE; OVERLAY; PATTERN DENSITY; PATTERNING TECHNIQUES; PITCH-SPLIT; RESIST SYSTEMS;

SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR SWITCHES;

NUMERICAL METHODS;

EID: 65849160645     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.828483     Document Type: Conference Paper

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