Pattern freezing process free litho-litho-etch double patterning

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7140, Issue , 2008, Pages

  Ando, Tomoyuki ^a   Takeshita, Masaru ^a   Takasu, Ryoich ^a   Yoshii, Yasuhiro ^a   Iwashita, Jun ^a   Matsumaru, Shogo ^a   Abe, Sho ^a   Iwai, Takeshi ^a  

^a TOKYO OHKA KOGYO CO LTD   (Japan)

Author keywords

32nm node; Double patterning; Litho litho etch double patterning; Pattern freezing free litho litho etch double patterning; Positive positive resist combination

Indexed keywords

32NM NODE; DOUBLE PATTERNING; LITHO-LITHO-ETCH DOUBLE PATTERNING; PATTERN FREEZING FREE LITHO-LITHO-ETCH DOUBLE PATTERNING; POSITIVE-POSITIVE RESIST COMBINATION;

NANOTECHNOLOGY;

FREEZING;

EID: 62449161477     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.804710     Document Type: Conference Paper

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