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Volumn 14, Issue 10, 2011, Pages

Characterization of modification of 193-nm photoresist by HBr plasma

Author keywords

[No Author keywords available]

Indexed keywords

CHAIN SCISSION; FOURIER TRANSFORM INFRARED; LINE EDGE ROUGHNESS; PATTERNED PHOTORESISTS; PLASMA TREATMENT;

EID: 80051616319     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3609838     Document Type: Article
Times cited : (8)

References (24)
  • 13
    • 0000205205 scopus 로고
    • M. Dole, Editor, Academic, New York and London
    • O. Saito, in The Radiation Chemistry of Macromolecules, Vol. 1, M. Dole, Editor, p. 223, Academic, New York and London (1972).
    • (1972) The Radiation Chemistry of Macromolecules , vol.1 , pp. 223
    • Saito, O.1
  • 16
    • 0001851296 scopus 로고
    • 10.1021/bk-1991-0475
    • J. A. Moore and J. O. Choi, ACS Symp. Ser., 475, 156 (1991). 10.1021/bk-1991-0475
    • (1991) ACS Symp. ser , vol.475 , pp. 156
    • Moore, J.A.1    Choi, J.O.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.