Plasma processing of soft materials for development of flexible devices

Thin Solid Films

Volumn 519, Issue 20, 2011, Pages 6721-6726

  Setsuhara, Yuichi ^a,d   Cho, Ken ^a,d   Takenaka, Kosuke ^a,d   Shiratani, Masaharu ^b,d   Sekine, Makoto ^c,d   Hori, Masaru ^c,d  

^a OSAKA UNIVERSITY   (Japan)

^b KYUSHU UNIVERSITY   (Japan)

^c NAGOYA UNIVERSITY   (Japan)

^d JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Hard X ray photoelectron spectroscopy; Inductively coupled plasma; Low inductance antenna; Low damage process; Organic inorganic device; X ray photoelectron spectroscopy

Indexed keywords

ARGON PLASMAS; BOND SCISSIONS; C-H BOND; CHEMICAL BONDING STRUCTURES; CONJUGATED SYSTEMS; ELECTRONIC FUNCTIONS; FLEXIBLE DEVICE; FUNCTIONAL LAYER; HARD X-RAY PHOTOELECTRON SPECTROSCOPY; INDUCTIVE COUPLINGS; LOW-DAMAGE PROCESS; LOW-INDUCTANCE ANTENNA; MAIN CHAINS; ORGANIC MATERIALS; ORGANIC-INORGANIC; PET FILMS; PHENYL GROUP; PHOTO-IRRADIATION; PHYSICAL DAMAGES; PLASMA EXPOSURE; PLASMA TECHNOLOGY; RF-POWER; SOFT MATERIAL; SUBSTRATE MATERIAL; SURFACE HEATING; SURFACE LAYERS; TEST MATERIALS;

ANTENNAS; ARGON; BONDING; CHEMICAL ANALYSIS; CHEMICAL BONDS; ELECTROMAGNETIC INDUCTION; ELECTRONS; INDUCTANCE; INDUCTIVELY COUPLED PLASMA; INVESTMENTS; MATERIALS; OXYGEN; PHOTOELECTRICITY; PHOTOELECTRON SPECTROSCOPY; PHOTONS; PLASMA INTERACTIONS; POLYETHYLENE TEREPHTHALATES; X RAY PHOTOELECTRON SPECTROSCOPY;

SURFACES;

EID: 80051551024     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.04.091     Document Type: Conference Paper

References (21)

1. I. Gancarz, G. Pozniak, and M. Bryjak Eur. Polym. J. 35 1999 1419
2. Y. Setsuhara, K. Cho, M. Shiratani, M. Sekine, M. Hori, E. Ikenaga, and S. Zaima Thin Sold Films 518 2010 3555
3. T. Steckenreiter, E. Balanzat, H. Fuess, and C. Trautmann Nucl. Instr. Meth. Phys. Res. B 131 1997 159
4. M. Day, and D.M. Willes J. Appl. Polymer Sci. 16 1972 203
5. S. Masseya, P. Cloutierb, L. Sancheb, and D. Roy Rad. Phys. Chem. 77 2008 889
6. S.I. Stoliarov, P.R. Westmoreland, M.R. Nyden, and G.P. Forney Polym. 44 2003 883
7. Y. Setsuhara, T. Shoji, A. Ebe, S. Baba, N. Yamamoto, K. Takahashi, K. Ono, and S. Miyake Surf. Coat. Technol. 174 - 175 2003 33
8. K. Takenaka, Y. Setsuhara, K. Nishisaka, and A. Ebe Jpn. J. Appl. Phys. 45 2006 8046
9. O. Tsuda, M. Ishihara, Y. Koga, S. Fujiwara, Y. Setsuhara, and N. Sato J. Phys. Chem. B 109 2005 4917
10. H. Deguchi, H. Yoneda, K. Kato, K. Kubota, T. Hayashi, K. Ogata, A. Ebe, K. Takenaka, and Y. Setsuhara Jpn. J. Appl. Phys. 45 2006 8042
11. Y. Setsuhara, K. Takenaka, A. Ebe, and K. Nishisaka Solid State Phenomena 127 2007 239
12. Y. Setsuhara, K. Takenaka, A. Ebe, and K. Nishisaka Plasma Process. Polym. 4 2007 S628
13. Y. Setsuhara, K. Takenaka, A. Ebe, and J.G. Han Surf. Coat. Technol. 202 2008 5230
14. K. Takenaka, Y. Setsuhara, K. Nishisaka, and A. Ebe Jpn. J. Appl. Phys. 47 2008 6900
15. E. Takahashi, Y. Nishigami, A. Tomyo, M. Fujiwara, H. Kaki, K. Kubota, T. Hayashi, K. Ogata, A. Ebe, and Y. Setsuhara Jpn. J. Appl. Phys. 46 2007 1280
16. Y. Setsuhara, K. Cho, M. Shiratani, M. Sekine, and M. Hori Thin Sold Films 518 2010 6492
17. K. Kobayashi Nucl. Instrum. Meth. Phys. Res. A 601 2009 32
18. S. Tanuma, C.J. Powell, and D.R. Penn Surf. Interface. Anal. 21 1994 165
19. T. Miyayama, N. Sanada, S.-I. Iida, J.S. Hammondb, and M. Suzuki Appl. Surf. Sci. 255 2008 951
20. N.-Y. Cui, D.J. Upadhyay, C.A. Anderson, B.J. Meenan, and N.M.D. Brown Appl. Surf. Sci. 253 2007 3865
21. F.A. Cotton, G. Wilkinson, and P.L. Gaus Basic Inorganic Chemistry 2nd edn. 1987 Wiley New York