X-Ray photoelectron spectroscopy analysis of plasma-polymer interactions for development of low-damage plasma processing of soft materials

Thin Solid Films

Volumn 518, Issue 22, 2010, Pages 6492-6495

  Setsuhara, Yuichi ^a,d   Cho, Ken ^a,d   Shiratani, Masaharu ^b,d   Sekine, Makoto ^c,d   Hori, Masaru ^c,d  

^a OSAKA UNIVERSITY   (Japan)

^b KYUSHU UNIVERSITY   (Japan)

^c NAGOYA UNIVERSITY   (Japan)

^d JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Inductively coupled plasma; Low damage process; Low inductance antenna; Polymer; X ray photoelectron spectroscopy

Indexed keywords

AFM IMAGE; ARGON PLASMAS; BOND SCISSIONS; CHEMICAL BONDING STRUCTURES; DAMAGE PROCESS; ION ENERGIES; LOW-INDUCTANCE ANTENNA; PHENYL GROUP; PLASMA EXPOSURE; PLASMA PROCESSING; POLYMER INTERACTIONS; SOFT MATERIAL; XPS ANALYSIS;

ANTENNAS; ARGON; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; CHEMICAL BONDS; DEGRADATION; ELECTRONS; INDUCTANCE; INDUCTIVELY COUPLED PLASMA; IONS; PHOTOELECTRICITY; PHOTONS; POLYETHYLENE TEREPHTHALATES; POLYMER FILMS; POLYMERS; SURFACE ROUGHNESS; X RAYS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 77956056051     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.01.057     Document Type: Conference Paper

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