High resolution surface morphology measurements using EBSD cross-correlation techniques and AFM

Ultramicroscopy

Volumn 111, Issue 8, 2011, Pages 1206-1213

  Vaudin, M D ^a   Stan, G ^a   Gerbig, Y B ^a   Cook, R F ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

AFM; Cross correlation; EBSD; Indentation

Indexed keywords

AFM; CROSS CORRELATION TECHNIQUES; CROSS-CORRELATION; EBSD; ELECTRON BACK-SCATTERED DIFFRACTION; HEIGHT PROFILES; HIGH RESOLUTION; INTERMITTENT CONTACT MODES; LATTICE DISPLACEMENT; LATTICE ROTATIONS; STRAIN-FREE; WEDGE INDENTATION;

ATOMIC FORCE MICROSCOPY; INDENTATION; MORPHOLOGY;

SURFACE MORPHOLOGY;

SILICON;

ANALYTIC METHOD; ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMICAL STRUCTURE; CONTROLLED STUDY; CORRELATIONAL STUDY; ELECTRON BACKSCATTER DIFFRACTION; ELECTRON DIFFRACTION; MATHEMATICAL COMPUTING; STRUCTURE ANALYSIS; SURFACE PROPERTY;

EID: 79960240062     PISSN: 03043991     EISSN: 18792723     Source Type: Journal    
DOI: 10.1016/j.ultramic.2011.01.039     Document Type: Article

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