High resolution measurements of strain and tilt distributions in SiGe mesas using electron backscatter diffraction

Applied Physics Letters

Volumn 89, Issue 24, 2006, Pages

  Wilkinson, Angus J ^a  

^a UNIVERSITY OF OXFORD   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETIC WAVE BACKSCATTERING; ELECTRON DIFFRACTION; RELAXATION PROCESSES; SEMICONDUCTOR GROWTH; STRAIN MEASUREMENT; STRESS ANALYSIS;

ELASTIC STRAIN; LATTICE CURVATURE; ROTATION TENSORS; STRAIN SENSITIVITY;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 33845782465     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2403904     Document Type: Article

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