SCOPUS 정보 검색 플랫폼

Volumn 326, Issue 1, 2011, Pages 212-217

Improvement on the synthesis technique of ultrananocrystalline diamond films by using microwave plasma jet chemical vapor deposition

(9) Lin, Chii Ruey a Liao, Wen Hsiang a Wei, Da Hua a Chang, Chien Kuo a Fang, Wei Chuan b Chen, Chi Liang c Dong, Chung Li d Chen, Jeng Lung e Guo, Jing Hua e

a NATIONAL TAIPEI UNIVERSITY OF TECHNOLOGY (Taiwan)

b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (Taiwan)

c INSTITUTE OF PHYSICS (Taiwan)

d NATIONAL SYNCHROTRON RADIATION RESEARCH CENTER (Taiwan)

e LAWRENCE BERKELEY NATIONAL LABORATORY (United States)

Author keywords

A1. Crystallites; A1. Near edge X ray absorption fine structure spectrum (NEXAFS); A3. Chemical vapor deposition processes; A3. Microwave plasma jet chemical vapor deposition (MPJCVD); B1. Diamond; B1. Ultrananocrystalline diamond (UNCD)

Indexed keywords

A1. CRYSTALLITES; A3. CHEMICAL VAPOR DEPOSITION PROCESSES; A3. MICROWAVE PLASMA JET CHEMICAL VAPOR DEPOSITION (MPJCVD); B1. DIAMOND; NEAR-EDGE X-RAY ABSORPTION FINE STRUCTURE SPECTRUM; ULTRANANOCRYSTALLINE DIAMONDS;

ABSORPTION; ABSORPTION SPECTROSCOPY; CARBON FILMS; CHEMICAL VAPOR DEPOSITION; FILM GROWTH; GRAIN SIZE AND SHAPE; MICROWAVES; PLASMA ACCELERATORS; PLASMA DEPOSITION; PLASMA JETS; PLASMAS; SURFACE ROUGHNESS; SYNTHETIC DIAMONDS; X RAY ABSORPTION;

DIAMOND FILMS;

EID: 79960177677 PISSN: 00220248 EISSN: None Source Type: Journal
DOI: 10.1016/j.jcrysgro.2011.01.100 Document Type: Conference Paper

Times cited : (17)

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