Effect of titanium powder assisted surface pretreatment process on the nucleation enhancement and surface roughness of ultrananocrystalline diamond thin films

Applied Surface Science

Volumn 255, Issue 15, 2009, Pages 6907-6913

  Pradhan, Debabrata ^a   Lin, I Nan ^a  

^a TAMKANG UNIVERSITY   (Taiwan)

Author keywords

Atomic force microscopy; Diamond nucleation; Glancing incidence XRD; Microwave plasma CVD; X ray photoelectron spectroscopy

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL STRUCTURE; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; NANODIAMONDS; NUCLEATION; PHOTOELECTRONS; PHOTONS; PLASMA CVD; SILICON; SILICON CARBIDE; SPECTROSCOPIC ANALYSIS; SURFACE DEFECTS; SURFACE ROUGHNESS; SURFACE TREATMENT; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; ULTRASONIC APPLICATIONS; X RAY ABSORPTION; X RAY DIFFRACTION;

DIAMOND NUCLEATION; GLANCING INCIDENCE X-RAY DIFFRACTIONS; MICROWAVE PLASMA CVD; NEAR EDGE X-RAY ABSORPTION FINE STRUCTURES; SPECTROSCOPIC STUDIES; ULTRA-NANOCRYSTALLINE DIAMOND; ULTRANANOCRYSTALLINE DIAMONDS; X-RAY PHOTOELECTRONS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 67349262357     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2009.03.013     Document Type: Article

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