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Volumn 11, Issue 7, 2011, Pages 3222-3226

Controlled heterogeneous nucleation and growth of germanium quantum dots on nanopatterned silicon dioxide and silicon nitride substrates

Author keywords

[No Author keywords available]

Indexed keywords

FABRICATION PROCESS; GE QUANTUM DOT; GERMANIUM QUANTUM DOTS; HETEROGENEOUS NUCLEATION AND GROWTH; NANO PATTERN; NANOPATTERNING; OSTWALD RIPENING PROCESS; OXIDATION TEMPERATURE; SELF ASSEMBLY PROCESS; SIGE LAYERS;

EID: 79960066919     PISSN: 15287483     EISSN: 15287505     Source Type: Journal    
DOI: 10.1021/cg200470f     Document Type: Article
Times cited : (10)

References (23)
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.