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Volumn 327, Issue 1, 2011, Pages 209-214
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Columnar microstructure of nanocrystalline Ga1-xMnxN films deposited by reactive sputtering
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Author keywords
A1. Nanostructures; A1. Transmission electron microscopy; A3. Sputtering; B1. Gallium manganese nitride
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Indexed keywords
A1. NANOSTRUCTURES;
A3. SPUTTERING;
AMORPHOUS SILICA;
B1. GALLIUM MANGANESE NITRIDE;
COLUMN AXIS;
COLUMNAR MICROSTRUCTURES;
DEPOSITION TIME;
ELECTRON TRANSMISSION;
ENERGY FILTERED TRANSMISSION ELECTRON MICROSCOPY;
FIBRE TEXTURE;
FILM MICROSTRUCTURES;
FILM SURFACES;
HIGH DENSITY;
INTERMEDIATE LAYERS;
MN CONCENTRATIONS;
NANO-COLUMNS;
NANOCRYSTALLINES;
NON-ORIENTED;
NUCLEATION SITES;
SPUTTERING DEPOSITION;
TRANSMISSION ELECTRON;
WURTZITE NANOCRYSTALS;
AMORPHOUS FILMS;
COALESCENCE;
DIFFRACTION;
ELECTRONS;
ENERGY DISPERSIVE SPECTROSCOPY;
HIGH RESOLUTION ELECTRON MICROSCOPY;
MANGANESE;
MICROSTRUCTURE;
NANOCRYSTALS;
NITRIDES;
REACTIVE SPUTTERING;
SILICA;
TRANSMISSION ELECTRON MICROSCOPY;
ZINC SULFIDE;
HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY;
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EID: 79959837880
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jcrysgro.2011.05.012 Document Type: Article |
Times cited : (9)
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References (28)
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