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Volumn 327, Issue 1, 2011, Pages 209-214

Columnar microstructure of nanocrystalline Ga1-xMnxN films deposited by reactive sputtering

Author keywords

A1. Nanostructures; A1. Transmission electron microscopy; A3. Sputtering; B1. Gallium manganese nitride

Indexed keywords

A1. NANOSTRUCTURES; A3. SPUTTERING; AMORPHOUS SILICA; B1. GALLIUM MANGANESE NITRIDE; COLUMN AXIS; COLUMNAR MICROSTRUCTURES; DEPOSITION TIME; ELECTRON TRANSMISSION; ENERGY FILTERED TRANSMISSION ELECTRON MICROSCOPY; FIBRE TEXTURE; FILM MICROSTRUCTURES; FILM SURFACES; HIGH DENSITY; INTERMEDIATE LAYERS; MN CONCENTRATIONS; NANO-COLUMNS; NANOCRYSTALLINES; NON-ORIENTED; NUCLEATION SITES; SPUTTERING DEPOSITION; TRANSMISSION ELECTRON; WURTZITE NANOCRYSTALS;

EID: 79959837880     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2011.05.012     Document Type: Article
Times cited : (9)

References (28)
  • 1
    • 0032516694 scopus 로고    scopus 로고
    • H. Ohno Science 281 1998 951
    • (1998) Science , vol.281 , pp. 951
    • Ohno, H.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.