Effect of structure variation on thermal conductivity of hydrogenated silicon film

Applied Surface Science

Volumn 257, Issue 20, 2011, Pages 8326-8329

  Li, Shibin ^a,b   Jiang, Yadong ^a   Wu, Zhiming ^a   Wu, Jiang ^b   Ying, Zhihua ^c   Wang, Zhiming ^b   Li, Wei ^a   Salamo, Gregory J ^b  

^a UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA   (China)

^b UNIVERSITY OF ARKANSAS   (United States)

^c HANGZHOU DIANZI UNIVERSITY   (China)

Author keywords

Gradient; Microcrystalline; Silicon film; Thermal conductivity

Indexed keywords

GRADIENT METHODS; HYDROGENATION; METALLIC FILMS; MICROCRYSTALLINE SILICON; PLASMA CVD; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SPECTROSCOPIC ELLIPSOMETRY; THERMAL CONDUCTIVITY; VOLUME FRACTION;

CRYSTALLINE SILICONS; CRYSTALLINE VOLUME FRACTION; EFFECTIVE MEDIUM; HYDROGENATED SILICON; MICROCRYSTALLINE; MICROCRYSTALLINE FILMS; SILICON FILMS; STRUCTURE VARIATION;

THERMAL CONDUCTIVITY OF SOLIDS;

EID: 79959344030     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2011.03.107     Document Type: Article

References (32)

1. T. Nguyen-Tran, V. Suendo, P. Roca, I. Cabarrocas, L.N. Nittala, S.N. Bogle, and J.R. Abelson J. Appl. Phys. 100 2006 094319
2. S.F. Ahmed, M.K. Mitra, and K.K. Chattopadhyay Appl. Surf. Sci. 253 2007 5480
3. S. Li, Z. Wu, Y. Jiang, W. Li, N. Liao, and J. Yu Appl. Surf. Sci. 254 2008 3274
4. B. Kalache, A.I. Kosarev, R. Vanderhaghen, and P. Roca i Cabarrocas J. Appl. Phys. 93 2003 1262
5. C. Calaza, N. Viarani, G. Pedretti, M. Gottardi, A. Simoni, V. Zanini, and M. Zen Sens. Actuators A 132 2006 129
6. M. Moreno, A. Kosarev, A. Torres, and R. Ambrosio Thin Solid Films 515 2007 7607
7. A.H.Z. Ahmed, and R.N. Tait IEEE Trans. Electron Dev. 52 2005 1900
8. S.B. Li, Z.M. Wu, W. Li, N.M. Liao, J.S. Yu, and Y.D. Jiang Phys. Stat. Sol. (a) 204 2007 4292
9. S.B. Li, Z.M. Wu, Y.D. Jiang, W. Li, N.M. Liao, and J.S. Yu Nanotechnology 19 2008 085706
10. W.M. Goubau, and R.A. Tait Phys. Rev. Lett. 34 1975 1220
11. I. Hatta, Y. Suga, R. Kato, and A. Maesono Rev. Sci. Instrum. 56 1985 1643
12. J. Alvarez-Quintana, and J. Rodríguez-Viejo Sens. Actuators A 142 2008 232
13. A. Syed, L. Romy, W. Thomas, L. Michael, Z. Ronny, F. Charlee, G. Tim, A. Jes, and S. Thomas Diamond Related Mater. 15 2006 389
14. J. Yang, J. Zhang, H. Zhang, and Y. Zhu Rev. Scientific Instrum. 81 2010 114902
15. N. Attaf, M.S. Aida, and L. Hadjeris Solid State Commun. 120 2001 525
16. S.B. Li, Z.M. Wu, Y. Kai, N.M. Liao, W. Li, and Y.D. Jiang Acta Phys. Sin. 57 2008 3126
17. A. Fontcuberta i Morral, and P. Roca i Cabarrocas Thin Solid Films 383 2001 161
18. A. Fontcuberta i Morral, H. Hofmeister, and P. Roca i Cabarrocas J. Non-Cryst. Solids 299-302 2002 284
19. A. Matsuda J. Non-Cryst. Solids 59-60 1983 767
20. Q.L. Song, Z. Cui, S.H. Xia, Z.F. Chen, and J.G. Zhang Sens. Actuators A 112 2004 122
21. P. Roura, D. Sanchez-Rodriguez, J. Farjas, Thermochim. Acta, in press, doi:10.1016/j.tca.2011.02.014.
22. F.X. Alvarez, D. Jou, and A. Sellitto Appl. Phys. Lett. 97 2010 033103
23. S. Uma, A.D. McConnell, M. Asheghi, K. Kurabayashi, and K.E. Goodson Int. J. Thermophys. 22 2001 605
24. W. Liu, and M. Asheghi J. Heat Transfer 128 2006 75
25. S. Logothedis, G. Kiriokidis, and E.C. Paloura J. Appl. Phys. 70 1991 2791
26. S. Sriraman, S. Agarwal, E.S. Aydil, and D. Maroudas Nature 418 2002 62
27. X. Liu, J. Feldman, and D. Cahill Phys. Rev. Lett. 102 2009 035901
28. H. Yang, D. Cahill, X. Liu, J. Feldman, R. Crandall, B. Sperling, and J. Abelson Phys. Rev. B 81 2010 104203
29. J. Boland, and G. Parson Science 256 1992 1304
30. I. Kaiser, N. Nickel, W. Fuhs, and W. Pilz Phys. Rev. B 58 1998 R1718
31. T. Kamiya, K. Nakahata, Y. Tan, Z. Durrani, and I. Shimizu J. Appl. Phys. 89 2001 6265
32. M. Aubain, and P. Bandaru Appl. Phys. Lett. 97 2010 253102