Measurement of SiNx thin film thermal property with suspended membrane structure

Sensors and Actuators, A: Physical

Volumn 112, Issue 1, 2004, Pages 122-126

  Song, Qinglin ^a   Cui, Zheng ^b   Xia, Shanhong ^a   Chen, Zhaofeng ^a   Zhang, Jiangang ^a  

^a INSTITUTE OF ELECTRONICS   (China)

^b RUTHERFORD APPLETON LABORATORY   (United Kingdom)

Author keywords

Membrane; Micromachining; Silicon nitride; Thermal property of thin film

Indexed keywords

ELECTRIC RESISTANCE; HEAT LOSSES; MICROMACHINING; SEMICONDUCTING SILICON COMPOUNDS; THERMAL CONDUCTIVITY; THERMAL EFFECTS; THICKNESS MEASUREMENT;

STEADY-STATE; THERMAL PROPERTY OF THIN FILM; THERMAL TIME CONSTANTS; TRANSIENT STATE;

THIN FILMS;

EID: 2142791839     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sna.2003.12.017     Document Type: Article

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