Noise in boron doped amorphous/microcrystallization silicon films

Applied Surface Science

Volumn 254, Issue 11, 2008, Pages 3274-3276

  Li, Shibin ^a   Wu, Zhiming ^a   Jiang, Yadong ^a   Li, Wei ^a   Liao, Naiman ^a   Yu, Junsheng ^a  

^a UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

1 f noise; Bolometer; Hydrogenated silicon; Microcrystallization; RTS noise

Indexed keywords

AMORPHOUS SILICON; BOLOMETERS; MICROCRYSTALLINE SILICON; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; TELEGRAPH SYSTEMS; X RAY DIFFRACTION;

MICROCRYSTALLIZATION; SWITCHING NOISE; UNCOOLED MICROBOLOMETERS;

FILM GROWTH;

EID: 39749120748     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.11.004     Document Type: Article

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