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Electrochemical and Solid-State Letters

Volumn 14, Issue 8, 2011, Pages

Fabrication of transparent TiO2-x channel-based thin film transistors using an oxygen-deficient TiO2-x target

(2) Choi, Kwang Hyuk a Kim, Han Ki a

a Kyung Hee University (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS TIO; CHANNEL LAYERS; COST-EFFICIENT; DIRECT-CURRENT MAGNETRON SPUTTERING; FREE OXIDES; GALLIUM OXIDES; INDIUM-FREE; NITROGEN AMBIENT; OXIDATION STATE; TIO;

GALLIUM; INDIUM; PHOTOELECTRON SPECTROSCOPY; RAPID THERMAL ANNEALING; THIN FILM DEVICES; THIN FILM TRANSISTORS; THIN FILMS; TITANIUM DIOXIDE; TRANSISTORS; X RAY PHOTOELECTRON SPECTROSCOPY;

OXYGEN;

EID: 79959250914 PISSN: 10990062 EISSN: None Source Type: Journal
DOI: 10.1149/1.3589983 Document Type: Article

Times cited : (24)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.