Blossom overlay metrology implementation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6518, Issue PART 1, 2007, Pages

  Ausschnitt, C P ^a   Chu, W ^a   Kolor, D ^a   Morillo, J ^a   Morningstar, J L ^a   Muth, W ^a   Thomison, C ^a   Yerdon, R J ^a   Binns, L A ^b   Dasari, P ^b   Fink, H ^b   Smith, N P ^b   Ananew, G ^b  

^a IBM MICROELECTRONICS   (United States)

^b NANOMETRICS INC   (United States)

Author keywords

Lithography; Optical microscopy; Overlay metrology; Process control

Indexed keywords

OVERLAY CAPABILITY; OVERLAY METROLOGY;

LITHOGRAPHY; OPTICAL MICROSCOPY; PROCESS CONTROL;

MEASUREMENT THEORY;

EID: 35148844191     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.712669     Document Type: Conference Paper

References (2)

1. C. P. Ausschnitt, et. al. "Multi-layer overlay metrology," Proc. SPIE 6152, Feb. 2006
2. L. W. Binns, et. al. "Overlay tool calibration," Proc. SPIE 6518, Feb. 2007