Dark field Double Dipole Lithography (DDL) for back-end-of-line processes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6520, Issue PART 1, 2007, Pages

  Burkhardt, M ^a   Burns, Sean ^a   Dunn, Derren ^b   Brunner, T A ^a   Hsu, Stephen D ^c   Park, Jungchul ^c  

^a IBM RESEARCH   (United States)

^b IBM   (United States)

^c ASML US Inc   (United States)

Author keywords

Double dipole lithography; Double exposure; EMF bias; Lithography; Microlithography; Resolution enhancement techniques

Indexed keywords

DOUBLE DIPOLE LITHOGRAPHY; DOUBLE EXPOSURE; EMF BIAS; RESOLUTION ENHANCEMENT TECHNIQUES;

CMOS INTEGRATED CIRCUITS; ELECTROMAGNETIC FIELD EFFECTS; MICROPROCESSOR CHIPS;

LITHOGRAPHY;

EID: 35148856243     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.713277     Document Type: Conference Paper

References (8)

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