CD changes of 193 nm resists during SEM measurement

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4345, Issue 1, 2001, Pages 179-189

  Kudo, Takanori ^a   Bae, Jun Bom ^a   Dammel, Ralph R ^a   Kim, Woo Kyu ^a   McKenzie, Douglas ^a   Dalil Rahman, M ^a   Padmanaban, Munirathna ^a   Ng, Waiman ^b  

^a CLARIANT CORPORATION   (United States)

^b KLA TENCOR CORPORATION   (United States)

Author keywords

193 nm resists; CD SEM; Cycloolefin maleic anhydride; Linewidth slimming; Methacrylate; Resist components

Indexed keywords

ELECTRON BEAMS; OLEFINS; RATE CONSTANTS; SCANNING ELECTRON MICROSCOPY; THERMAL EFFECTS;

LINEWIDTH SLIMMING;

PHOTORESISTS;

EID: 0034757313     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.436847     Document Type: Article

References (14)